关键字导读: ETCH PVD PECVD MOCVD MEMS CMP COATING CLEAN DETECT TRACK
新萄京MIAOSHU:GAOJIEJINGDENGJI,GAOSUCHUANPIAN,PENGZHUANGBAOHU,Mapping,SEMIRENZHENGS2,F47,YINGHEGEXINGHUASHEJISHOUZHIJIJIEKOUYONGHUKEDINGZHI。
简介
新萄京Introduction
OUHECHUANDONG、SIFUQUDONG、JIEJINGCHUANDONGJIRUNHUA、SCARASHOUBEIJIEGOU,JUYOUZHANYONGKONGJIANXIAO、DASHENSUOBI、GAOJINGDU、GAOJIEJINGDUDENGYOUDIAN。YINGHEGEXINGHUASHEJI,SHOUZHIJIJIEKOUYONGHUKEDINGZHI,WANGLUOHUAKONGZHIXITONG,GAOSUCHUANPIANXIAOLVHEPENGZHUANGBAOHUGONGNENG,SEMIRENZHENGS2、F47,MCBFDAYU1000WANCI。FUZEWANCHENGJINGYUANZAIFOUP、HUANCHONGSHI、GONGYIWEIZHIDENGZHIJIANDEZIDONGCHUANSONG。SHIBANDAOTIXINGYEDEYOUYUEZHIXUANZE。
参数
Parameter
结构形式Mechanical Structure | 柱坐标型/SCARA型 Cylindrical Coordinate/SCARA | |
---|---|---|
负载Payload | 名称name | 晶圆wafer |
直径diameter | Φ200mm/Φ300mm | |
重量weight | ≤0.5kg | |
自由度数DOF | 4 | |
手数量Number of Arm | 2 | |
最大回转直径Maximum Swing diameter | 520mm | |
YUNDONGFANWEI Moving Range | 升降轴 (Z轴)Up/Down( Z)-Axis | 450mm |
回转轴 (T轴) Rotational(T)-Axis | 350° | |
伸展轴 (R轴) Extension(Z)-Axis | R760mm | |
ZUIDASUDU Maximum Moving Speed | 升降轴 (Z轴)Up/Down( Z)-Axis | 375mm/s |
回转轴 (T轴) Rotational(T)-Axis | 360° | |
伸展轴 (R轴) Extension(Z)-Axis | 1100mm/s | |
ZHONGFUDINGWEIJINGDU Repeatability | 升降轴 (Z轴)Up/Down( Z)-Axis | ±0.1 mm(3σ) |
回转轴 (T轴) Rotational(T)-Axis | ±0.01°(3σ) | |
伸展轴 (R轴) Extension(Z)-Axis | ±0.1 mm(3σ) | |
洁净度Clean Class | CLASS 1 | |
主机重量Body Weight | 70 kg | |
电源Power Supply | VAC 220V±10% |
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